Industry

Semiconductor Equipment Components

Why High-Purity needed

For New Component Manufacturing
  • Preventing Contamination:
    Semiconductor manufacturing is highly sensitive to microscopic particles, as contaminants can directly impact wafer yield and performance.
  • Ensuring Electrical Performance:
    Residual chemicals or particles may affect circuit performance, leading to short circuits or leakage currents.
  • Maintaining Process Stability:
    High cleanliness standards reduce process defects and enhance product reliability.
  • Preventing Depositional Chemical Contamination:
    Eliminate interference with signal strength, signal distortion, abnormal signals, and circuit impedance anomalies.

 

For Refurbishing Used Components
  • Removing Deposits:
    Long-term use of vacuum chamber components leads to plasma deposits and metal oxide accumulation, necessitating thorough cleaning.
  • Extending Service Life:
    Our advanced cleaning techniques effectively remove contaminants, ensuring the stable long-term operation of your components.

Maintaining high cleanliness levels in both new manufacturing and refurbishing of semiconductor components is crucial for optimal performance and reliability.

Industry Cleanliness Standard

Strict Cleanliness Standards
  • Vacuum/Laser Equipment New Components:
    Should ensure that no particles larger than 1-5μm are present.
  • Thin Film/Organic Surface Deposits:
    Controlled within 10-100 ng/cm² to maintain optimal performance.
  • Refurbished Components:
    Adhering to strict limits on metal ion content, we ensure that elements such as sodium (Na), magnesium (Mg), aluminum (Al), calcium (Ca), chromium (Cr), iron (Fe), and nickel (Ni) do not exceed 0.1 ppb.

These rigorous cleanliness standards are essential for ensuring the reliability and performance of your semiconductor equipment components.

Our Solutions

VAP(Vaccume Activated Purification)Patented Cleaning Technology
  • Deep Cleaning in Complex 0.1μm Gaps to remove embedded contaminants.
  • 360° Rotating Spray System ensures thorough cleaning, even in hard-to-reach areas.
  • Ultrasonic Technology enhances cleaning effectiveness.
  • High-Efficiency Ultra-Clean Filtration System to maintain maximum cleanliness.
  • Multiple High-Performance Drying Systems to ensure residue-free drying.

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